叠加能量C^＋注入SiO2薄膜的光致发光特性

首次采用叠加能量离子注入技术制备Ｃ＾＋注入ＳｉＯ２薄膜样品，室温下观测到很强的蓝光发射。通过测量样品的光致发光谱对退火条件的依赖关系，研究了样品的发光特性。对发光机制进行了初步探讨。     

Ion irradiation—induced structure damage to botanic samples using the ion transmission energy spectrum

1 INTRODUCTIONThe new aPplications of low energy heavy ion beam in irradi4ted botanical materialswere studied in recellt yeaxs. The beaminduced mutation effect on crop seeds has causedthe attention of physicist and biologists.[1l:] FOr examPle, 1ow energy ions can induceremarkable mutation to rice seeds.[3] There are many special phenomena when heavyions bombard botanic sW1e due to its special structure. Some studies showed that tllepenetration depths of some ions were far larger than t…     

离子注入对Cr12MoV钢表面组织结构和力学性能的影响

研究了Ｃｒ１２ＭｏＶ钢离子注入层的显微组织特征及其对表面性能的影响。结果表明，离子注入使Ｃｒ１２ＭｏＶ钢的表面硬度和耐磨性能得到显著改善，且存在着一个最佳的注入剂量，约为３×１０＾１＾７Ｎ＾＋／ｃｍ＾２左右。离了注入在Ｃｒ１２ＭｏＶ钢表面层中形成了大量细小弥散的第二相粒子，并使α－Ｆｅ晶格发生严重畸变，从而引起材料表面强化。     

GIC－4117／HC1．7MV Tandetron上的MeV离子注入系统

利用通用离子公司（ＧＩＣ）的４１１７型１．７ＭＶＴａｎｄｅｔｒｏｎ离子束分析设备进行ＭｅＶ级离子注入。所注入的离子能量范围由５００ｋｅＶ到１０ＭｅＶ，离子的质量在２４０ｕ以下，某些元素的负离子束流强度在１５０μＡ以上。双向机械扫描技术可将离子均匀地注入样片。     

Subsurface structures in initial stage of FeSi2 growth studied by high-resolution Rutherford backscattering spectroscopy

The initial stage of iron silicide formation is investigated by high-resolution Rutherford backscattering spectroscopy. During the Fe deposition on Si(001) at 470 °C, the formation of FeSi₂ is confirmed by the surface peak analysis. Initially, FeSi₂ grows epitaxially so that one of the major crystallographic axes is parallel to the <111> axis of the Si substrate. With increasing Fe deposition, the deviation between the major crystallographic axis of the silicide region and Si<111> increases although the electron diffraction pattern is independent of the amount of Fe deposition. Therefore, the subsurface crystallographic structure of iron silicide is transformed from a cubic-like to a low-symmetry structure.     

Magnetic force microscopy studies on the magnetic ordering in organic materials induced by high-energy proton irradiation

In this study, ferromagnetic microstructures in highly oriented pyrolytic graphite and superparamagnetic spots in polyimide foils were created by 2.25 MeV proton microbeam irradiation and characterized using atomic and magnetic force microscopy. For this purpose, graphite samples were irradiated with cross-like patterns of 15 μm × 15 μm size using ion fluences in the range of (0.003–2.5) × 10¹⁸ cm⁻². The irradiated crosses showed strong magnetic signals and a complex domain structure in the magnetic images depending on the geometrical dimensions of the crosses. Furthermore, polyimide foils were irradiated with microspots and fluences in the range of (0.016–3.1) × 10¹⁹ cm⁻². Magnetic force microscopy shows very strong phase shifts in these irradiated areas.     

电子束和离子注入处理鸡冠花种子对当代(Mo)植株生长发育影响的初步研究

利用电子束和氮离子、氢离子注入处理普通鸡冠花干种子,试验结果表明,两种诱变处理均能显著抑制鸡冠花植株的生长、发育,并能有效地诱发花性状变异,变异株率可达0.5%—2%。电子束处理鸡冠花干种子的半致死剂量(LD50)经测定为1.2kGy左右;离子注入处理的半致死剂量随注入离子种类不同而不同,N 注入的半致死剂量(LD50)为1.6×1017/cm2,H 注入的半致死剂量应低于1.6×1016/cm2。鸡冠花干种子电子束处理的适宜剂量为1.5kGy左右,离子注入处理的适宜方法是N 1.6×1016/cm2。同时鸡冠花对高剂量辐照较不敏感,是一种耐强辐照的资源。     

Secondary ion emission from Ti and Si targets induced by medium energy Ar ion bombardment - Experiment and computer simulation

The paper presents experimental results of secondary ion energy distributions obtained for Ti and Si targets bombarded by 20-30 keV monoisotope Ar⁺ ion beam. The influence of the extraction voltages between target and a slit of the electrostatic energy analyzer entrance on the energy distributions of secondary ions was investigated. After optimization of the secondary ion extraction system, the mass spectra of secondary ions were also measured. The investigations were done using recently built experimental system. Experimental data are compared with the computer simulation results obtained using TRQR and SATVAL codes.     

等离子体浸没离子注入和沉积技术制备TiN薄膜研究

利用多功能等离子体浸没离子注入设备 ,采用等离子体浸没离子注入和沉积技术在Ti合金表面制备具有优异力学性能的TiN薄膜。研究了真空室中氮气存在状态及氮气压力对薄膜性能的影响 :当氮以中性气体存在于真空室中 ,薄膜的生长主要受热力学因素控制 ,沿着低自由能的密排面 (低指数面 )TiN(1 1 1 )择优生长 ;当氮以等离子体状态存在于真空室中 ,薄膜沿着高指数面TiN(2 2 0 )择优生长 ,具有高硬度、耐磨性好的优点 ,并且随着N分压的提高 ,薄膜耐磨性提高